Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses
Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses
复制标题
通过单飞秒激光脉冲非线性处理对烷基硅氧烷单层进行亚波长图案化
DOI：
10.1063/1.2939585
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发表时间：
2008
影响因子：
4
通讯作者：
B. Chichkov
中科院分区：
文献类型：
--
作者：
N. Hartmann;S. Franzka;J. Koch;A. Ostendorf;B. Chichkov
本文研究了石英玻璃表面十八烷基硅氧烷单分子膜的飞秒激光图形化。选择性分解的涂层与单激光脉冲在亚波长分辨率可以进行在很宽的范围内的能量密度从4.2下降到3.1J scincm 2。特别地，在1.8μm的1闪烁激光光斑直径下，制备了宽度低至250nm及以下的结构。这开辟了一条通往激光制造透明模板的简易路线，其化学结构可达100 nm以下。
Femtosecond laser patterning of octadecylsiloxane monolayers on quartz glass at λ=800nm, τ<30fs, and ambient conditions has been investigated. Selective decomposition of the coating with single laser pulses at subwavelength resolution can be carried out over a wide range of fluences from 4.2 down to 3.1J∕cm2. In particular, at a 1∕e laser spot diameter of 1.8μm, structures with a width down to 250nm and below were fabricated. This opens up a facile route towards laser fabrication of transparent templates with chemical structures down into the sub-100-nm-regime.