Characterization of a nanocrystalline NiTiHf high temperature shape memory alloy thin film
Characterization of a nanocrystalline NiTiHf high temperature shape memory alloy thin film
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DOI：
10.1016/j.scriptamat.2005.01.030
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发表时间：
2005-05
影响因子：
6
通讯作者：
Y. Tong;Y. Liu;J. Miao;Liancheng Zhao
中科院分区：
文献类型：
--
作者：
Y. Tong;Y. Liu;J. Miao;Liancheng Zhao
采用直流磁控溅射法制备了纳米晶Ni47.9Ti35.7Hf16.4高温形状记忆合金薄膜。研究了该合金的晶化行为、显微组织和马氏体相变。讨论了退火温度对Mstemperature的影响。
A nanocrystalline Ni47.9Ti35.7Hf16.4high temperature shape memory alloy thin film was fabricated by using DC magnetron sputtering deposition followed by rapid thermal annealing. Crystallization behavior, microstructure and martensitic transformation were studied. The dependence of Mstemperature on annealing temperature is discussed.