An AlGaN tunnel junction light emitting diode operating at 255 nm
An AlGaN tunnel junction light emitting diode operating at 255 nm
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DOI:
10.1063/5.0036286
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发表时间:
2020-12
影响因子:
4
通讯作者:
A. Pandey;J. Gim;R. Hovden;Z. Mi
中科院分区:
文献类型:
--
作者:
A. Pandey;J. Gim;R. Hovden;Z. Mi
We report on the demonstration of high-performance tunnel junction deep ultraviolet (UV) light-emitting diodes (LEDs) by using plasmaassisted molecular beam epitaxy. The device heterostructure was grown under slightly Ga-rich conditions to promote the formation of nanoscale clusters in the active region. The device operates at 255 nm with a maximum external quantum efficiency of 7.2% and wall-plug of 4%, which are nearly one to two orders of magnitude higher than those of previously reported tunnel junction devices operating at this wavelength. The devices exhibit highly stable emission, with a nearly constant emission peak with increasing current, due to the strong charge carrier confinement related to the presence of Ga-rich nanoclusters. Efficiency droop, however, is observed at relatively low current densities. Detailed temperature-dependent measurements suggest that the presence of efficiency droop of deep UV LEDs is largely due to electron overflow. Published under license by AIP Publishing. https://doi.org/10.1063/5.0036286 Light within the UV-C wavelength range (10%. Previous work has investigated the critical effect of the thickness of the tunnel junction and doping of the p-AlGaN layers on device characteristics. Earlier studies on nitride tunnel junction structures have also shown that the transport of carriers across the tunnel junction is primarily determined by trapassisted tunneling, indicating the crucial role of incorporating Appl. Phys. Lett. 117, 241101 (2020); doi: 10.1063/5.0036286 117, 241101-1 Published under license by AIP Publishing Applied Physics Letters ARTICLE scitation.org/journal/apl