Use of Supramolecular Assemblies as Lithographic Resists
Use of Supramolecular Assemblies as Lithographic Resists
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DOI：
10.1002/anie.201700224
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发表时间：
2017-06-06
影响因子：
16.6
通讯作者：
Winpenny, Richard E. P.
中科院分区：
文献类型：
--
作者：
Lewis, Scott M.;Fernandez, Antonio;Winpenny, Richard E. P.
一种新的抗蚀剂材料的电子束光刻已经创建，是基于超分子组装。初步研究表明，通过这种超分子方法，可以写入高分辨率结构，当暴露于涉及等离子体的蚀刻条件时，这些结构显示出前所未有的选择性。
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.