High-Performance MEA Prepared by Direct Deposition of Platinum on the Gas Diffusion Layer Using an Atomic Layer Deposition Technique
High-Performance MEA Prepared by Direct Deposition of Platinum on the Gas Diffusion Layer Using an Atomic Layer Deposition Technique
复制标题
采用原子层沉积技术在气体扩散层上直接沉积铂制备高性能 MEA
DOI:
10.1016/j.electacta.2015.03.031
复制
发表时间:
2015-09
影响因子:
6.6
通讯作者:
Du, Li
中科院分区:
文献类型:
--
作者:
Hsieh, Chien-te;Su, Ay;Song, Hui-yu;Du, Li
A high-performance membrane electrode assembly (MEA) with low platinum loading was successfully prepared using an atomic layer deposition (ALD) technique, in which the platinum was directly deposited on the gas diffusion layer to form the catalyst layer. MEAs were fabricated with an ALD-prepared electrode as the anode, and assembled with pretreated Nafion®membrane (Nafion®117) and a commercial cathode. The MEAs were evaluated in a single-cell test station and characterized by cyclic voltammetry (CV), field-emission scanning electron microscope (FE-SEM), high-resolution transmission electron microscope (HRTEM) and grazing incident X-ray diffraction (XRD). The results revealed that the active component, Pt, was highly dispersed in the ALD anode, and the MEA with the ALD anode showed excellent activity and stability. The mass activity reached 4.80 kW g Pt−1, which was 2.53 times higher than that of the MEA with the anode prepared using the commercial catalyst and a conventional screen printing method. In 100 h of durability testing, the ALD–MEA exhibited excellent durability (98.2% voltage retention) compared with the CC–MEA (92.5% voltage retention) when the MEA was discharged at a current density of 400 mA cm−2. The high performance, along with low platinum loading and high platinum utilization, make the ALD technique promising for use in PEM fuel cells.
登录
查看更多内容
影响因子:
15
作者:
Liao, SJ;Holmes, KA;Birss, VI
通讯作者:
Birss, VI
影响因子:
9.2
作者:
Fouda-Onana, F.;Guillet, N.;AlMayouf, A. M.
通讯作者:
AlMayouf, A. M.
影响因子:
7.2
作者:
Junsheng Zheng;Tian Tian-Tian;Yuan Gao;Qiang Wu;J. Ma;Jim P. Zheng
通讯作者:
Junsheng Zheng;Tian Tian-Tian;Yuan Gao;Qiang Wu;J. Ma;Jim P. Zheng
影响因子:
10.8
作者:
Shuifen Xie;Sang‐Il Choi;N. Lu;Luke T. Roling;J. Herron;Lei Zhang;Jinho Park;Jinguo G Wang
通讯作者:
Shuifen Xie;Sang‐Il Choi;N. Lu;Luke T. Roling;J. Herron;Lei Zhang;Jinho Park;Jinguo G Wang
影响因子:
56.9
作者:
Lim, Byungkwon;Jiang, Majiong;Xia, Younan
通讯作者:
Xia, Younan