Mutual diffusion in the titanium-vanadium-niobium system
Mutual diffusion in the titanium-vanadium-niobium system
复制标题
钛-钒-铌体系中的相互扩散
DOI:
10.1007/bf00897962
复制
发表时间:
1985
期刊:
影响因子:
--
通讯作者:
E. Sokolovskaya
中科院分区:
文献类型:
--
作者:
B. K. Aitbaev;V. Gryzunov;E. Sokolovskaya
Mutual diffusion is investigated in the Ti-V-Nb system at 1000 and 1200°C. A computation is performed by the Matano-Kirkaldy method for 89 points of an isothermal section at 1200°C and 101 points at 1000°C. Niobium was selected as solvent. It is found that the diagonal mutual diffusion coefficients grow by almost two orders as the composition approaches the titanium angle. Nondiagonal coefficients take on both positive and negative values.