Ultrathin W-Al dual interlayer approach to depositing smooth and adherent nanocrystalline diamond films on stainless steel.
Ultrathin W-Al dual interlayer approach to depositing smooth and adherent nanocrystalline diamond films on stainless steel.
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DOI：
10.1021/am9007159
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发表时间：
2010-01
影响因子：
9.5
通讯作者：
Y. S. Li;Y. Tang;Qiaoqin Yang;J. Maley;R. Sammynaiken;T. Regier;C. Xiao;Akira Hirose
中科院分区：
文献类型：
--
作者：
Y. S. Li;Y. Tang;Qiaoqin Yang;J. Maley;R. Sammynaiken;T. Regier;C. Xiao;Akira Hirose
金刚石涂层在钢表面的附着力通常较低，需要用较厚的中间层来加强。本文采用纳米级W-Al双金属过渡层在不锈钢304基体上沉积出连续、附着力强、表面光滑的金刚石薄膜。在微波等离子体增强化学气相沉积过程中，30 nm厚的Al内层扩散到钢表面，抑制碳扩散和石墨化。20 nm厚的W外层转变为W碳化物，既防止碳扩散又增强金刚石成核。合成的金刚石膜纯度高，表面光滑，结构致密。压痕和剪切变形实验表明，金刚石薄膜具有很高的抗分层能力。
The adherence of diamond coated on steel is commonly low and needs to be strengthened with thick intermediate layers. In this paper, a nanoscale W-Al dual metal interlayer has been applied on SS304 substrates to facilitate deposition of continuous, adherent and smooth diamond thin films. During the microwave plasma-enhanced chemical vapor deposition process, the Al inner layer 30 nm thick diffuses into steel surface inhibiting carbon diffusion and graphitization. The W outer layer 20 nm thick is transformed into W carbides, both preventing carbon diffusion and enhancing diamond nucleation. The diamond films synthesized are of high purity and have smooth surfaces and dense structures. Indentation and shear deformation tests indicate high delaminating tolerance of the diamond films.