Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure
Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure
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DOI：
10.1016/j.optlaseng.2015.12.002
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发表时间：
2016-04
影响因子：
4.6
通讯作者：
Hung-Fei Kuo;Yijun Huang
中科院分区：
文献类型：
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作者：
Hung-Fei Kuo;Yijun Huang
以数字微镜器件 (DMD) 作为核心部件的数字掩模光刻系统已广泛用于定义印刷电路板 (PCB) 上的图案。本研究基于场追踪技术设计了点阵投影光刻的光学模块参数，以提高曝光平面上的航拍图像质量。在实现的点阵投影光刻光学模块中，使用DMD作为动态数字掩模，并使用405 nm波长的激光器来照射DMD。然后激光通过光学模块中的微透镜阵列聚焦形成点阵列并投射到动态扫描台上。通过计算光束重叠率、平台速度、光斑直径和 DMD 帧速率，并将它们编程到平台和 DMD 同步控制器中，点阵列在光刻胶上形成线图案。此外，利用脉冲宽度调制（PWM）技术来操作DMD镜的激活周期，有效地控制了曝光并实现了小于10μm的特征线宽。
Digital-mask lithography systems, with a digital micromirror device (DMD) as their central piece, have been widely used for defining patterns on printed circuit board (PCB). This study designed optical module parameters for point-array projection lithography based on field tracing technique to improve the quality of the aerial image on the exposure plane. In the realized optical module for the point-array projection lithography, a DMD was used as the dynamic digital-mask, and a 405-nm-wavelength laser was used to illuminate the DMD. The laser was then focused through the micro-lens array in the optical module to form a point array and was projected onto a dynamic scanning stage. By calculating the beam-overlapping rate, stage velocity, spot diameter, and DMD frame rate and programming them into the stage- and DMD-synchronized controller, the point array formed line patterns on the photoresist. Furthermore, using pulse width modulation (PWM) technique to operate the activation periods of the DMD mirrors effectively controlled the exposure and achieved a feature linewidth of less than 10 μm.