FORMATION OF POLYMER MICROSTRUCTURES BY SELECTIVE DEPOSITION OF POLYION MULTILAYERS USING PATTERNED SELF-ASSEMBLED MONOLAYERS AS A TEMPLATE
FORMATION OF POLYMER MICROSTRUCTURES BY SELECTIVE DEPOSITION OF POLYION MULTILAYERS USING PATTERNED SELF-ASSEMBLED MONOLAYERS AS A TEMPLATE
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DOI：
10.1021/ma00126a040
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发表时间：
1995-10-23
期刊：
影响因子：
5.5
通讯作者：
WHITESIDES, GM
中科院分区：
文献类型：
--
作者：
HAMMOND, PT;WHITESIDES, GM
I.导论.自组装制备离子多层膜技术一直是高分子科学和有机薄膜领域的研究热点。1-4这些技术利用带相反电荷的分子或大分子的离子相互作用，依次构建薄膜，一次一个单层; 1控制这些膜的结构的能力和该方法的相对通用性（与LB膜技术相比）有助于将该方法快速纳入材料研究。通过这种方法制备的系统包括导电聚合物和电致发光薄膜，以及那些集成陶瓷和金属化合物层的系统。6-8我们先前已经描述了使用微接触印刷（CP）在金上图案化多种官能化烷硫醇盐自组装单层（SAM）的微米尺寸特征的方法。910该方法利用从母盘模制的聚（二甲基硅氧烷）印模，使用烷醇“油墨”转移图像，特征尺寸低至100 nm。在下面的通信中，我们已经探索了使用图案化的自组装膜作为模板的离子带电聚合物多层膜的选择性沉积。在这项初步研究中，我们使用了常见的聚电解质：磺化聚苯乙烯（SPS），聚（二烯丙基二甲基氯化铵）（PDAC），聚（烯丙基胺盐酸盐）（PAH）。实验部分。通过电子束蒸发50 A的钛作为粘附促进层，随后200 A的金到硅晶片（Si/SiO2）（Silicon Sense）上来制备金基底。使用pCP，金表面用2.5 μ π ι的十六烷基乙基醚CH 3（CH 2）18 SH（CH 3）或16-巯基十六烷酸HS（CH 2）18 COOH（COOH）图案化，间隔3.5 μ π ι。对于大多数情况，然后将金基底浸入5 mM的寡聚-（乙二醇）-封端的烷乙氧基SH（CH 2）u-（OCH 2CH 2LOH（EGn，n= 2-7））溶液中10秒以覆盖剩余的金区域，然后用乙醇和庚烷冲洗。低聚乙二醇封端的烷醇用于防止离子聚合物吸附到图案中的裸金区域上;
I. Introduction. Techniques for fabrication of ionic multilayers by self-assembly have been of great interest in the polymer science andorganic thin films com-munities. 1-4 These techniques take advantage of the ionic interactions of oppositely charged molecules or macromolecules to build thin films sequentially, one monolayer at a time; 1 the ability to control the archi-tecture of these films and the relative versatility of the method (compared to LB film techniques) have contributed to the rapid incorporation of the method into materials research. Systems that have been prepared by this procedure include conducting polymers and electroluminescent films, 5 and those that integrate layers of ceramic and metallic compounds. 6-8 We have previously described methods to pattern micron-sized features of a large variety of functionalized alkanethiolate self-assembled monolayers (SAMs) on gold using microcontact printing («CP). 910 This method utilizes a poly (dimethylsiloxane) stamp molded from a photolithographic master to transfer an image using an alkanethiol “ink”, with feature sizes down to 100 nm. In the following communication, we have explored the use of patterned SAMs as a template for the selective deposition of ionically charged polymer multilayers. For this initial study, we used common polyelectrolytes: sulfonated polystyrene (SPS), poly (diallyldimethylam-monium chloride)(PDAC), and poly (allylamine hydrochloride)(PAH).II. Experimental Section. Gold substrates were prepared by electron beam evaporation of 50 A of titanium as an adhesion-promoting layer, followed by 200 A of gold, onto silicon wafers (Si/Si02)(Silicon Sense). UsingpCP, the gold surface was patterned with 2.5/imlines of hexadecanethiol CH3 (CH2) isSH (CH3) or 16-mercaptohexadecanoic acid HS (CH2) igCOOH (COOH), separated by 3.5 pm spaces. For most cases, gold substrates were then dipped into a 5 mM solution of oligo-(ethylene glycol)-terminated alkanethiol SH (CH2) u-(OCH2CH2LOH (EGn, n= 2—7) for 10 s to cover the remaining gold regions andthen rinsed with ethanol and heptane. The oligo (ethylene glycol)-terminated alkanethiol was used to prevent adsorption of the ionic polymers onto the regions of bare gold in the pattern;