Properties and preparation conditions of carbon nitride thin films deposited by laser CVD
Properties and preparation conditions of carbon nitride thin films deposited by laser CVD
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DOI:
10.1016/s0008-6223(98)00003-7
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发表时间:
1998
期刊:
影响因子:
10.9
通讯作者:
F. Falk;J. Meinschien;K. Schuster;H. Stafast
中科院分区:
文献类型:
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作者:
F. Falk;J. Meinschien;K. Schuster;H. Stafast