High Resolution Investigation of the Rod-Shaped Scattering from a (111) Si Surface by a Synchrotron Radiation Source
High Resolution Investigation of the Rod-Shaped Scattering from a (111) Si Surface by a Synchrotron Radiation Source
复制标题
同步辐射源对 (111) Si 表面棒状散射的高分辨率研究
DOI：
10.1143/jjap.26.l2026
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发表时间：
1987
影响因子：
1.5
通讯作者：
A. Stevenson
中科院分区：
文献类型：
--
作者：
N. Kashiwagura;Y. Kashihara;M. Sakata;J. Harada;S. Wilkins;A. Stevenson
利用高分辨率X射线光谱仪和同步辐射光源，研究了两个(111)硅片表面经过不同处理后，由晶体截断(RSCT)引起的棒状散射。结果表明，通过对RSCT的精确测量，基于原子尺度上的表面粗糙度和马赛克块的取向偏差来表征晶体表面是可能的。
By using a high resolution X-ray spectrometer in conjunction with a synchrotron radiation source, the rod-shaped scattering due to crystal truncation (RSCT), which is elongated along the normal of a crystal surface through a Bragg point, was investigated for two (111) silicon wafers of which the surfaces were differently processed. It is shown that the characterization of a crystal surface, on the basis of surface roughness on an atomic scale and the misorientation of mosaic blocks, is really possible by the precise measurement of the RSCT.