Double Higgs production at NNLO interfaced to parton showers in GENEVA
Double Higgs production at NNLO interfaced to parton showers in GENEVA
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DOI：
10.1007/jhep06(2023)205
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发表时间：
2022-12
影响因子：
5.4
通讯作者：
S. Alioli;Georgios Billis;A. Broggio;A. Gavardi;S. Kallweit;M. Lim;Giulia Marinelli;R. Nagar;D. Napoletano
中科院分区：
文献类型：
--
作者：
S. Alioli;Georgios Billis;A. Broggio;A. Gavardi;S. Kallweit;M. Lim;Giulia Marinelli;R. Nagar;D. Napoletano
本文在G eneva框架下，在重上限近似下，研究了部分子簇射下次-次-首阶Higgs玻色子对的产生。这包括重新确定零喷射量的大幅度误差，直至次超前对数精度。这一过程的特点是一个非常大的动量转移，这使得它的研究特别相关的匹配方案，如在G eneva，其中使用的变量的重新命名不同的顺序中使用的部分子淋浴。为了进一步研究这种效应，我们扩展了为Pythia 8设计的原始簇射接口，以包括其他部分子簇射，如D ire和S herpa。
In this work, we study the production of Higgs boson pairs at next-to-next-to-leading order in QCD matched to parton showers, using the G eneva framework and working in the heavy-top-limit approximation. This includes the resummation of large logarithms of the zero-jettiness0 up to the next-to-next-to-next-to-leading-log accuracy. This process features an extremely large momentum transfer, which makes its study particularly relevant for matching schemes such as that employed in G eneva, where the resummation of a variable different from that used in the ordering of the parton shower is used. To further study this effect, we extend the original shower interface designed for P ythia 8 to include other parton showers, such as D ire and S herpa.