Versatile Method of Submicroparticle Pattern Formation Using Self-Assembly and Two-Step Transfer
Versatile Method of Submicroparticle Pattern Formation Using Self-Assembly and Two-Step Transfer
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利用自组装和两步转移形成亚微米图案的多功能方法
DOI：
10.1109/jmems.2007.897091
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发表时间：
2007
影响因子：
2.7
通讯作者：
Osamu Tabata
中科院分区：
文献类型：
--
作者：
Takashi Ozaki;K. Sugano;T. Tsuchiya;Osamu Tabata
我们提出了一种具有高生产率、灵活性和准确性的亚微粒图案形成方法。该方法由模板辅助自组装粒子自组装和随后的两步转移组装粒子。通过实验对工艺参数进行了优化，以评价各参数对各工艺产率的影响。使用直径为500 nm的聚苯乙烯颗粒，并将硅晶片用作本文所述实验中的目标基板。在自组装过程中，70%的图案成功地在硅模板衬底上自组装。在第一个转移步骤中，获得了79%的转移率与自组装单层涂层的聚二甲基硅氧烷载体基板。在第二转移步骤中，115 ℃的转移温度提供了85%的最大转移产率。通过优化的工艺参数实现了48%的总工艺产率，并成功地证明了所提出的方法可以制造任何亚微粒图案。
We propose a method of submicroparticle pattern formation with high productivity, flexibility, and accuracy. The proposed process is composed of template-assisted self-assembly for particle self-assembly and a subsequent two-step transfer of the assembled particles. Optimization of the process parameters was performed by carrying out experiments to evaluate the effects of the parameters on the yields of each process. Polystyrene particles that are 500 nm in diameter were used, and a silicon wafer was used as a target substrate in the experiments that are described in this paper. In the self-assembly process, 70% of the pattern was successfully self-assembled on a silicon template substrate. In the first transfer step, a transfer yield of 79% was obtained with a self-assembled-monolayer-coated polydimethylsiloxane carrier substrate. In the second transfer step, a transfer temperature of 115 provided the maximum transfer yield of 85%. The overall process yield of 48% was achieved by the optimized process parameters, and it was successfully demonstrated that the proposed method can fabricate any submicroparticle pattern.