Correction for chromatic aberration in microscope projection photolithography

Correction for chromatic aberration in microscope projection photolithography
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显微镜投影光刻中的色差校正

DOI：
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发表时间：
1983
期刊：
影响因子：
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通讯作者：
A. Davidson
A. Davidson
中科院分区：
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文献类型：
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作者：
M. Brady;A. Davidson

文献摘要

被引文献

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我们测量了几种显微镜物镜的紫外色散，发现它们在用于光刻胶的多色曝光时都受到轴向色差的限制。我们展示了如何测量和校正紫外焦移，并估计校正后的分辨率。某些透镜能够在毫米视野内产生微米级的特征。
We have measured the ultraviolet dispersion of several microscope objectives and we find that all of them are limited by axial chromatic aberration when used for polychromatic exposure of photoresist. We show how to measure and correct for the ultraviolet focus shift, and estimate the corrected resolution. Certain lenses are able to produce micron features over millimeter fields.