Absolute sputtering yields from solid Ne by low energy He+ and Arq+ (1 ≥ q ≥ 6) impact
Absolute sputtering yields from solid Ne by low energy He+ and Arq+ (1 ≥ q ≥ 6) impact
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低能 He+ 和 Arq+ (1 ≥ q ≥ 6) 影响下固体 Ne 的绝对溅射产额
DOI：
10.1088/1742-6596/163/1/012083
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发表时间：
2009
期刊：
影响因子：
--
通讯作者：
T. Hirayama
中科院分区：
文献类型：
--
作者：
S. Fujita;T. Tachibana;T. Koizumi;T. Hirayama
本文测量了低能He ~+和Ar ~+（1 ≥ q ≥ 6）轰击固体Ne表面的绝对溅射产额。已经观察到非常大的溅射产额（对于1 keV He+冲击为300原子/离子，对于1 keV Ar+冲击为3000原子/离子）。一个显着的溅射产率上的电荷状态，即势能，入射离子的Arq+没有被观察到，因为它估计是远远小于动力学溅射，这表明潜在的溅射机制是类似于那些已知的电子和光子刺激的解吸过程。
Absolute sputtering yields from the surface of solid Ne by low energy He+ and Arq+ (1 ≥ q ≥ 6) impact are measured. Very large sputtering yields (300 atoms/ion for 1 keV He+ impact, and 3000 atoms/ion for 1keV Ar+ impact) have been observed. A significant dependence of the sputtering yields on the chage state, i.e. the potential energy, of the incident ion for Arq+ has not been observed because it is estimated to be much smaller than that of the kinetic sputtering, which suggests that the mechanism of potential sputtering is similar to those known for the electron- and photon-stimulated desorption processes.