Resonant Raman scattering of a single layer of Si nanocrystals on a silicon substrate
Resonant Raman scattering of a single layer of Si nanocrystals on a silicon substrate
复制标题
硅基底上单层硅纳米晶体的共振拉曼散射
DOI:
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发表时间:
2004
期刊:
影响因子:
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通讯作者:
C. Bonafos
中科院分区:
文献类型:
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作者:
A. Wellner;V. Paillard;H. Coffin;N. Cherkashin;C. Bonafos
We report Raman spectra of a single layer of silicon nanoparticles, spatially ordered in SiO2 at a tunneling distance from a silicon substrate. This is achieved by exploiting effects which enhance the nanocrystal signal, while suppressing the substrate one. The method is applied to investigate the structure of ion-implantation-produced Si nanoparticles annealed under different conditions. The results, which are in good agreement with transmission electron microscopy data, are used to explain photoluminescence measurements.