Surface Evaluation of Fluorinated Diamond-Like Carbon Thin Film as an Antisticking Layer of Nanoimprint Mold
Surface Evaluation of Fluorinated Diamond-Like Carbon Thin Film as an Antisticking Layer of Nanoimprint Mold
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DOI：
10.1143/jjap.46.6373
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发表时间：
2007-09
影响因子：
1.5
通讯作者：
N. Yamada;K. Nakamatsu;K. Kanda;Y. Haruyama;S. Matsui
中科院分区：
文献类型：
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作者：
N. Yamada;K. Nakamatsu;K. Kanda;Y. Haruyama;S. Matsui
以射频（RF）等离子体化学气相沉积（CVD）法制备的类金刚石（DLC）薄膜和氟化自组装单层膜（SAM）为参考，研究了有望成为纳米压印模具新型防粘层的氟化类金刚石（F-DLC）薄膜的表面性质。从X射线光电子能谱（XPS）的测量中，发现F-DLC薄膜的表面被疏水CFx组分覆盖。此外，通过测量水滴与热压印过程重复次数的接触角来评估F-DLC薄膜的耐久性。经过100次以上的压印，F-DLC薄膜的接触角几乎保持不变的初始值，并获得了精细的复制图案。从这些结果中，发现F-DLC薄膜适合作为热纳米压印模具的新型防粘层。
The surface property of fluorinated diamond-like carbon (F-DLC) thin film, which is expected to be a new antisticking layer of nanoimprint mold, was evaluated with reference to the commercial diamond-like carbon (DLC) thin film formed by radio-frequency (RF) plasma chemical vapor deposition (CVD) and the fluorinated self-assembled monolayer (SAM). From the measurement of X-ray photoelectron spectrum (XPS), the surface of the F-DLC thin film was found to be overspread with hydrophobic CFx components. In addition, the durability of the F-DLC thin film was evaluated by the contact angle measurement of a water drop against repeating times of the thermal imprint process. After over 100 times of imprinting, the contact angles of the F-DLC thin film were almost kept constant with the initial value and a fine replicated pattern was obtained. From these results, the F-DLC thin film was found to be suitable as a novel antisticking layer of the thermal nanoimprint mold.