Dimensionality Crossover of the Nonlinear Resistance in Quench-Condensed Indium Films
Dimensionality Crossover of the Nonlinear Resistance in Quench-Condensed Indium Films
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淬火凝聚铟膜非线性电阻的维数交叉
DOI：
10.1143/jpsj.64.3397
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发表时间：
1995
影响因子：
1.7
通讯作者：
H. Hirai
中科院分区：
文献类型：
--
作者：
S. Okuma;K. Enya;H. Hirai
本文测量了厚度为14 nm、26 nm和65 nm的铟猝缩薄膜的非线性电阻（I - V特性）与厚度的关系。14nm厚薄膜的I - V曲线与之前用二维Kosterlitz-Thouless （KT）理论很好地描述超导特性的更薄薄膜（5nm）的结果在质量上相似。相比之下，较厚的薄膜则明显不同。当I在低温下从零升高时，会出现非线性的I - V曲线（电阻），呈现负曲率。
Thickness dependence of the nonlinear resistance ( I - V characteristics) has been measured in quench-condensed films of indium with thicknesses of 14 nm, 26 nm and 65 nm. The I - V curves for the 14 nm-thick film are qualitatively similar to the previous result for the much thinner film (5 nm) whose superconducting properties were well described by the two-dimensional (2D) Kosterlitz-Thouless (KT) theory. In contrast, those for the thicker films are markedly different. As I is raised from zero at low temperatures, there appears the nonlinear I - V curve (resistance) which exhibits negative curvature.