Optical ablation by high-power short-pulse lasers
Optical ablation by high-power short-pulse lasers
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DOI：
10.1364/josab.13.000459
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发表时间：
1996-02-01
影响因子：
1.9
通讯作者：
Perry, MD
中科院分区：
文献类型：
--
作者：
Stuart, BC;Feit, MD;Perry, MD
在 1053 nm 和 526 nm 下，脉冲持续时间 7 范围从 140 fs 到 1 ns，对均质和多层电介质以及镀金光学器件进行激光诱导损伤阈值测量。实验和理论上发现，对于 1053 nm 脉冲，金涂层在亚皮秒范围内的能量限制为 0.6 J/cm(2)。在电介质中，我们发现损伤形态存在质的差异，并且偏离了扩散主导的 tau(1/2) 标度，这表明损伤是由等离子形成和烧蚀造成的，tau 小于或等于 10 ps，而 tau > 50 ps 则由传统加热和熔化造成。基于多光子电离、焦耳加热和碰撞（雪崩）电离产生电子的理论模型与实验结果的脉冲宽度和波长缩放定量一致。 (C) 1996 美国光学学会
Laser-induced damage threshold measurements were performed on homogeneous and multilayer dielectrics and gold-coated optics at 1053 and 526 nm for pulse durations 7 ranging from 140 fs to 1 ns. Gold coatings were found, both experimentally and theoretically, to be limited to 0.6 J/cm(2) in the subpicosecond range for 1053-nm pulses. In dielectrics, we find qualitative differences in the morphology of damage and a departure from the diffusion-dominated tau(1/2) scaling that indicate that damage results from plasma formation and ablation for tau less than or equal to 10 ps and from conventional heating and melting for tau > 50 ps. A theoretical model based on electron production by multiphoton ionization, joule heating, and collisional (avalanche) ionization is in quantitative agreement with both the pulse-width and the wavelength scaling of experimental results. (C) 1996 Optical Society of America