Gate-enhanced thermoelectric effects in all-carbon quantum devices
Gate-enhanced thermoelectric effects in all-carbon quantum devices
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全碳量子器件中的栅极增强热电效应
DOI:
10.1016/j.carbon.2016.08.014
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发表时间:
2016-11
期刊:
影响因子:
10.9
通讯作者:
Wang X. F.
中科院分区:
文献类型:
--
作者:
Liu Y. S.;Shao X. Y.;Shao T.;Zhang J. Y.;Kuang Y. W.;Zhang D. B.;Shao Z. G.;Yu H. L.;Hong X. K.;Feng J. F.;Yang X. F.;Chen X. S.;Wang X. F.
The possibility to improve thermoelectric performance of carbon-based quantum devices is of fundamental and importance in the fields of energy conservation, environmental protection, and green energy. Here we propose an effective avenue to enhance the thermoelectric figure of merits (TE-FOMs) of an all-carbon quantum device with the help of first-principles methods, and the device is constructed by a zigzag-edged trigonal graphene (ZTG) connected with zigzag-edged graphene nanoribbons (ZGNR) electrodes through the carbon atomic chains (CACs). Using a gate field, the spin-up transmission peak can be tuned from the position below the Fermi level to that above the Fermi level. However, the position of the spin-down transmission peak above the Fermi level is insensitive to the gate field. Therefore, the device can be converted from the p type to n type for the spin-up component by a gate field, while for the spin-down component the device remains n type. Meanwhile, we also find that the charge (spin) TE-FOMs at the Fermi level can be increased to about eight (three) times as compared with the case in the absence of the gate field. These TE-FOMs can also be significantly improved by tuning the incident electron energy and temperature.
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影响因子:
3.7
作者:
Yaojun Dong;Xuefeng Wang;M. Zhai;Jian-chun Wu;Liping Zhou;Q. Han;Xue-Mei Wu
通讯作者:
Yaojun Dong;Xuefeng Wang;M. Zhai;Jian-chun Wu;Liping Zhou;Q. Han;Xue-Mei Wu
DOI:
10.25673/3724
发表时间:
2007
期刊:
--
影响因子:
--
作者:
G. Metalidis
通讯作者:
G. Metalidis
影响因子:
3.5
作者:
Yu-Shen Liu;Debao Zhang;Xifeng Yang;Jinlong Feng
通讯作者:
Yu-Shen Liu;Debao Zhang;Xifeng Yang;Jinlong Feng
DOI:
10.1039/c5cp02779a
发表时间:
2015-08
期刊:
Physical chemistry chemical physics : PCCP
影响因子:
--
作者:
Xifeng Yang;H. L. Wang;Y. S. Chen;Y. Kuang;X. Hong;Y. S. Liu;Jinfu Feng;Xinxin Wang
通讯作者:
Xifeng Yang;H. L. Wang;Y. S. Chen;Y. Kuang;X. Hong;Y. S. Liu;Jinfu Feng;Xinxin Wang
影响因子:
3.7
作者:
Munarriz, J.;Gaul, C.;Dominguez-Adame, F.
通讯作者:
Dominguez-Adame, F.