Effect of dissolution kinetics on feature size in dip-pen nanolithography
Effect of dissolution kinetics on feature size in dip-pen nanolithography
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DOI：
10.1103/physrevlett.88.255505
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发表时间：
2002-06-24
影响因子：
8.6
通讯作者：
De Yoreo, JJ
中科院分区：
文献类型：
--
作者：
Weeks, BL;Noy, A;De Yoreo, JJ
我们已经调查了湿度，尖端速度，和停留时间上的特征尺寸在蘸笔纳米光刻的影响。我们的研究结果表明，两个不同的沉积制度之间的过渡发生在一个独立的湿度停留时间。虽然特征尺寸随湿度增加，但相对增加与停留时间无关。结果由一个模型描述，该模型考虑了尖端的分离和再附着。该模型表明，在短的停留时间（高速），最重要的参数控制的特征尺寸是硫醇脱离的活化能。
We have investigated the effects of humidity, tip speed, and dwell time on feature size during dip pen nanolithography. Our results indicate a transition between two distinct deposition regimes occurs at a dwell time independent of humidity. While feature size increases with humidity, the relative increase is independent of dwell time. The results are described by a model that accounts for detachment and reattachment at the tip. The model suggests that, at short dwell times (high speed), the most important parameter controlling the feature size is the activation energy for thiol detachment.