Ultraviolet-H2O2 oxidation of surfactants
Ultraviolet-H2O2 oxidation of surfactants
复制标题
表面活性剂的紫外-H2O2氧化
DOI：
10.1007/s10311-002-0006-3
复制
发表时间：
2003
影响因子：
15.7
通讯作者：
A. Luis
中科院分区：
文献类型：
--
作者：
J. Sanz;J. Lombraña;A. Luis
本文介绍了用化学氧化和光解氧化处理表面活性剂合成溶液的研究。直链烷基苯磺酸盐（LAS）的合成溶液中处理这项工作，因为这是一个模型化合物，通常用于洗涤剂的配方，在城市和工业废水中有很大的存在。应用紫外线（UV）辐射结合过氧化氢氧化线性烷基苯磺酸盐（LAS）被证明是合适的作为一个主要的氧化步骤，因为在最有利的情况下，实现约50%的原始化合物的转化率。首先，在这项工作中的退化水平上的操作变量的影响进行了分析。同时考虑了直接光解和自由基进攻的贡献，建立了一个动力学模型。直接光解进行，以确定在单一的光解反应的量子产率。此外，在不同的操作条件下，在H_2O_2/UV氧化体系中，测定了羟基自由基与直链烷基苯磺酸盐反应的速率常数。最后，量化每个氧化途径的贡献，导致在所有情况下，在一个更高的贡献的自由基反应比光解。
This paper describes a study of the treatment of surfactant synthetic solutions by chemical and photolytic oxidation. Synthetic solutions of linear alkylbenzene sulfonates (LAS) are treated in this work as this is a model compound commonly used in the formulation of detergents, with a great presence in urban and industrial waste-waters. The application of ultraviolet (UV) radiation combined with hydrogen peroxide to oxidize linear alkylbenzene sulfonates (LAS) is shown to be suitable as a primary oxidation step since conversions of about 50% of the original compounds are achieved in the most favorable cases. Initially, the influence of the operating variables on the degradation levels is analyzed in this work. A kinetic model that considers the contributions of both direct photolysis and radical attack is also worked out. Direct photolysis is performed to determine the quantum yield in the single photodecomposition reaction. In addition, the rate constant of the reaction between hydroxyl radicals and linear alkylbenzene sulfonates in the oxidizing system H2O2/UV is determined for different operational conditions. Finally, the contribution of each oxidation pathway is quantified, resulting in a higher contribution of the radical reaction than of photolysis in all cases.