Field enhancement in apertureless near-field scanning optical microscopy

Field enhancement in apertureless near-field scanning optical microscopy
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DOI:
10.1364/josaa.18.002998
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发表时间:
2001-12-01
影响因子:
1.9
通讯作者:
Gallagher, A
Gallagher, A
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Bohn, JL;Nesbitt, DJ;Gallagher, A

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用多极子技术研究了无孔近场扫描光学显微镜探头的近场,得到了硅探头尖端和玻璃衬底附近的光场。结果表明,在硅尖附近可以实现~gt;15相对于入射场的电场增强,这意味着强度增强了几个数量级。这种增强既源于细长探头的天线效应,也源于当探头靠近衬底表面且其图像偶极子起作用时的邻近效应。(C)2001年美国光学学会。
The near field of an apertureless near-field scanning optical microscopy probe is investigated with a multiple-multipole technique to obtain optical fields in the vicinity of a silicon probe tip and a glass substrate. The results demonstrate that electric field enhancements of > 15 relative to the incident fields can be achieved near a silicon tip, implying intensity enhancements of several orders of magnitude. This enhancement arises both from the antenna effect of the elongated probe and from a proximity effect when the probe is near the substrate surface and its image dipoles play a role. (C) 2001 Optical Society of America.