Effects of the substrate temperature on the bioglass films deposited by pulsed laser
Effects of the substrate temperature on the bioglass films deposited by pulsed laser
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基板温度对脉冲激光沉积生物玻璃薄膜的影响
DOI：
10.1016/j.apsusc.2008.04.092
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
Jian Liu
中科院分区：
文献类型：
--
作者：
Yafan Zhao;Ming;Chuanzhong Chen;Jian Liu
利用傅里叶变换红外光谱（FTIR）和划痕仪研究了基片温度对脉冲激光沉积玻璃薄膜结合形态和结合强度的影响。薄膜的表面形貌致密，颗粒分布在薄膜表面，薄膜的结构为非晶玻璃。绑定配置与目标的绑定配置不同。薄膜的Si-O-NBO/Si-O-Si（s）强度比与目标相比有所下降。此外，这种趋势随着衬底温度的降低而明显。这种效应是由于玻璃的特殊结构和脉冲激光沉积（PLD）的复杂物理机制导致了薄膜生长过程中的网络重排。划痕试验结果表明，在200°C下沉积的薄膜具有最高的附着强度。
Effects of the substrate temperature on the bonding configuration and adhesion strength of the bioglass films deposited by pulsed laser were investigated by Fourier transform infrared spectroscopy (FTIR) and scratch apparatus. Morphology of the films is compact with the particles on the surface of them and the structure is amorphous glass. Bonding configuration is different from that of the target. Si–O–NBO/Si–O–Si (s) intensity ratios of the films decline as compared with the target. Besides, this tendency is obvious as the substrate temperature decreases. This effect is attributed to the network rearrangement during the film growth, which is associated to special structure of glass and complex physical mechanisms of pulsed laser deposition (PLD). Scratch test results show that the film deposited at 200°C has the highest adhesion strength.