Smart optical measurement probe for autonomously detecting nano-defects on bare semiconductor wafer surface: highly sensitive observation system using phase-contrast microscopy with a spatial light modulator
Smart optical measurement probe for autonomously detecting nano-defects on bare semiconductor wafer surface: highly sensitive observation system using phase-contrast microscopy with a spatial light modulator
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用于自动检测裸露半导体晶圆表面纳米缺陷的智能光学测量探头：使用带有空间光调制器的相差显微镜的高灵敏度观察系统
DOI：
10.1088/1742-6596/2368/1/012014
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发表时间：
2022
期刊：
影响因子：
--
通讯作者：
M. Michihata and S. Takahashi
中科院分区：
文献类型：
--
作者：
Y. Guan;S. Masui;S. Kadoya;M. Michihata and S. Takahashi
目前，半导体工艺的良率受到裸硅表面纳米级缺陷的强烈影响。因此，需要一种无损的、高速的纳米颗粒污染检测方法。在本研究中，基于挥发性惰性液体的挥发过程是一个自主的纳米粒子搜索探针，提出了一种纳米粒子检测方法。提出了一种动态相衬显微镜（Dynamic PCM），用于检测液体薄膜的微小厚度变化，灵敏度高。动态PCM的灵敏度是普通PCM的两倍，并进行了实验验证。根据以往的研究结果，使用该动态PCM，预计10nm粒子的强度变化将达到4%，5nm粒子的强度变化将超过1.5%。
Nowadays, the yield rate of semiconductor process is strongly affected even by nanoscale defects on bare Si wafer surfaces. Therefore, a non-destructive and high-speed method for detection of nanoparticle contamination is highly demanded. In this research, a nanoparticle detection method is proposed based on the fact that the volatilization process of the volatile inert liquid behaves as an autonomous nanoparticle search probe. Dynamic phase contrast microscopy (Dynamic PCM) is proposed to detect small thickness changes of a thin liquid film with high sensitivity. The dynamic PCM is expected to have double sensitivity compared to normal PCM and it is experimentally verified. Based on previous results, 4% intensity change is expected for 10 nm particles and even over 1.5% intensity change is expected for 5 nm particles by using this proposed dynamic PCM.