Thin film growth by pulsed laser deposition
Thin film growth by pulsed laser deposition
复制标题
脉冲激光沉积薄膜生长
DOI：
10.1007/978-3-662-08251-5_80
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发表时间：
1994
期刊：
影响因子：
--
通讯作者：
I. Boyd
中科院分区：
文献类型：
--
作者：
I. Boyd
描述了使用脉冲蒸发沉积（PLD）来生长各种薄的多组分膜，包括电介质层、保护层和超导层。简要回顾了激光-靶相互作用和材料从被照射表面去除的基本原理。此外，特别是该技术的优点和缺点进行了讨论，并提出了未来的发展方向。
The use of Pulsed Iaver Deposition (PLD) to grow a variety of thin multicomponent films, including dielectric, protective, and superconducting layers, is described. The underlying principles governing the laser-target interaction and removal of material from the irradiated surface are briefly reviewed. Additionally, particular advantages and disadvantages of the technique are discussed, and future directions proposed.