High-speed growth of (103)-oriented Ba2TiO4 film by laser chemical vapor deposition
High-speed growth of (103)-oriented Ba2TiO4 film by laser chemical vapor deposition
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DOI：
10.1016/j.matlet.2011.11.094
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发表时间：
2012-03
影响因子：
3
通讯作者：
Dongyun Guo;T. Goto;Chuanbin Wang;Q. Shen;Lianmeng Zhang
中科院分区：
文献类型：
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作者：
Dongyun Guo;T. Goto;Chuanbin Wang;Q. Shen;Lianmeng Zhang
采用激光化学气相沉积法在Pt/Ti/SiO2/Si基体上制备了Ba2TiO4薄膜。研究了取向、微观结构和生长模式。在高沉积速率（Rdep=45.6μmh−1）下获得了具有（103）择优取向的单相Ba2TiO4薄膜。 Pt (111)/Ti/SiO2/Si 衬底上的 (103) 取向 Ba2TiO4 薄膜由于晶格失配较小而表现出 Ba2TiO4[103]//Pt [1–10] 生长模式。表面由矩形晶粒组成，截面为柱状显微组织。
Ba2TiO4film was prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition. The orientation, microstructure and growth mode were investigated. The single-phase Ba2TiO4film was obtained with (103) preferred orientation at high deposition rate (Rdep=45.6μmh−1). The (103)-oriented Ba2TiO4film on Pt (111)/Ti/SiO2/Si substrate showed the Ba2TiO4[103]//Pt [1–10] growth mode due to the small crystal-lattice mismatch. The surface consisted of rectangular grains, and the cross-section was columnar microstructure.