UPGRADE OF IONIZATION PROFILE MONITOR (IPM) IN THE J-PARC 3-GeV RCS
UPGRADE OF IONIZATION PROFILE MONITOR (IPM) IN THE J-PARC 3-GeV RCS
复制标题
J-PARC 3-GeV RCS 中电离分布监测器 (IPM) 的升级
DOI：
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发表时间：
2012
期刊：
影响因子：
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通讯作者：
M. Yoshimoto
中科院分区：
文献类型：
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作者：
H. Harada;Kazami Yamamoto;M. Yoshimoto
J-PARC 3-GeV RCS 中使用残余气体电离轮廓监测器 (IPM) 来观察循环横向束流轮廓。在IPM系统中，穿过腔室的束流产生的离子和电子在外部电场的作用下引导至微通道板（MCP），并且来自MCP的信号被观察为束流轮廓。 IPM系统有一个升级计划，用于通过选举优化电场和束流轮廓观察。这将报告 IPM 的升级概念和状态。
Residual gas Ionization Profile Monitors (IPMs) are used in the J-PARC 3-GeV RCS for the observation of circulating transverse beam profile. In IPM system, the ions and electrons produced by the beam passing through chamber lead to Micro Channel Plate (MCP) by the external electric field, and the signals from the MCP are observed as the beam profile. The IPM system has an upgrade plan for the optimization of the electric fields and the observation of beam profile by the elections. This will be reported the upgrade concept and status of the IPM.