Evaluation of Organic Monolayers Formed on Si(111): Exploring the Possibilities for Application in Electron Beam Nanoscale Patterning
Evaluation of Organic Monolayers Formed on Si(111): Exploring the Possibilities for Application in Electron Beam Nanoscale Patterning
复制标题
Si(111) 上形成的有机单分子层的评估：探索在电子束纳米级图案化中应用的可能性
DOI：
10.1143/jjap.40.4845
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发表时间：
2001
影响因子：
1.5
通讯作者：
T. Osaka
中科院分区：
文献类型：
--
作者：
Taro Yamada;N. Takano;Keiko Yamada;Shuhei Yoshitomi;Tomoyuki Inoue;T. Osaka
本文研究了在Si（111）上制备有机单层膜的方法、电子束辐照对单层膜的影响以及金属原子在辐照区的沉积，旨在发展一种在Si（111）晶片表面大规模制备纳米尺度图案的工艺。采用电解对位取代重氮苯盐的方法和与不同烷基基团的格氏反应以及反应步骤在氢封端的Si（111）晶片表面制备了有机单分子膜。使用这些电解方法，部分良好定义的二维单层形成，这是，然而，被沉淀的副产品掩盖。的格氏反应沉积均匀的单层部分的烷基基团随机排列，适合于表面钝化。在O2或H2O气氛中，对Si（111）上的有机单层进行电子束轰击。轰击区域以良好控制的方式被有效氧化。通过将被轰击的试样浸入NiSO 4+（NH 4）2SO 4水溶液中，仅在电子轰击区域内选择性地浸渍Ni。在此基础上，提出了利用有机单层膜制作纳米尺度单层图形的方法。
The methods of preparing organic monolayers on Si(111), the effects of electron-beam irradiation onto these monolayers, and the deposition of metal atoms over the irradiated areas have been investigated in order to develop a process of mass-scale production of nanometer-scale patterns on Si(111) wafer surfaces. The organic monolayers were fabricated on hydrogen-terminated Si(111) wafer surfaces using previously reported methods for the electrolysis of para-substituted benzenediazonium salts and the Grignard reaction with various alkyl moieties and reaction procedures. Using these electrolysis methods, partially well-defined two-dimensional monolayers were formed, which were, however, obscured by precipitated by-products. The Grignard reaction deposited homogeneous monolayer moieties of alkyl groups which were randomly arranged and are suitable for surface passivation. Electron-beam bombardment of the organic monolayers on Si(111) was performed in an atmosphere of O2 or H2O. The bombarded area was effectively oxidized in a well-controlled manner. By immersing the bombarded specimen into an aqueous NiSO4+(NH4)2SO4 solution, Ni was selectively impregnated only within the area of electron bombardment. Based on these results, application of organic monolayers for fabricating nanometer-scale monolayer patterns is proposed.