Minimum reaction network necessary to describe Ar/CF4 plasma etch

Minimum reaction network necessary to describe Ar/CF4 plasma etch
复制标题

DOI:
10.1117/12.2297502
复制
发表时间:
2018-03
期刊:
--
影响因子:
--
通讯作者:
Sofia Helpert;Meghali Chopra;R. Bonnecaze
Sofia Helpert;Meghali Chopra;R. Bonnecaze
中科院分区:
其他
文献类型:
--
作者:
Sofia Helpert;Meghali Chopra;R. Bonnecaze

文献摘要

相似文献

由于等离子体放电和等离子体-表面相互作用的复杂性,预测使用等离子体工艺产生的刻蚀和沉积分布是具有挑战性的。体积平均全球模型允许有效地预测重要的工艺参数,并提供了一种快速确定各种工艺输入对等离子体放电的影响的方法。然而,基于简化的假设来描述化学反应网络的全球模型是有限的。在这里,使用平台RODEO(沉积和蚀刻配方优化)对Ar/CF4等离子体的128个反应的数据库进行了编辑,并从24个源收集了它们对应的速率常数。测试了6个不同的反应集,它们使用了从12个到所有128个反应的任何地方来评估反应数据库对粒子物种密度和电子温度的影响。由于我们的数据库中使用的许多反应具有相互冲突的速率常数,我们也提出了一种在构建模型时处理这些不确定性的方法,包括对每个反应速率的加权和对离群值的过滤。通过分析反应速率常数与其对预测的等离子体密度和电子温度的影响之间的联系,我们确定了反应被认为是等离子体模型所必需的条件。这项研究的结果为确定等离子体模型的反应集合中必须包括哪一组最小反应提供了基础。
Predicting the etch and deposition profiles created using plasma processes is challenging due to the complexity of plasma discharges and plasma-surface interactions. Volume-averaged global models allow for efficient prediction of important processing parameters and provide a means to quickly determine the effect of a variety of process inputs on the plasma discharge. However, global models are limited based on simplifying assumptions to describe the chemical reaction network. Here a database of 128 reactions is compiled and their corresponding rate constants collected from 24 sources for an Ar/CF4 plasma using the platform RODEo (Recipe Optimization for Deposition and Etching). Six different reaction sets were tested which employed anywhere from 12 to all 128 reactions to evaluate the impact of the reaction database on particle species densities and electron temperature. Because many the reactions used in our database had conflicting rate constants as reported in literature, we also present a method to deal with those uncertainties when constructing the model which includes weighting each reaction rate and filtering outliers. By analyzing the link between a reaction’s rate constant and its impact on the predicted plasma densities and electron temperatures, we determine the conditions at which a reaction is deemed necessary to the plasma model. The results of this study provide a foundation for determining which minimal set of reactions must be included in the reaction set of the plasma model.