Laser chemical vapor deposition of Lu2O3:Eu scintillation film
Laser chemical vapor deposition of Lu2O3:Eu scintillation film
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激光化学气相沉积Lu2O3:Eu闪烁薄膜
DOI：
10.1088/2053-1591/ab2000
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发表时间：
2019-08-01
影响因子：
2.3
通讯作者：
Zhao, Jingtai
中科院分区：
文献类型：
--
作者：
Chang, Jingyu;Qi, Yunhang;Zhao, Jingtai
Lu2O3:Eu闪烁膜是硬x射线成像最有吸引力的候选者之一，特别是在20kev以上。采用激光化学气相沉积技术，首次在无取向Lu2O3单晶衬底上制备了厚度为10 μ m的Lu2O3:Eu微柱状薄膜。用扫描电镜观察所得膜的形貌。对其光致发光和闪烁特性进行了测量和讨论，包括光致发光激发和光致发光曲线、光致发光衰减曲线和x射线激发发光曲线。
Lu2O3:Eu scintillation film is one of the most attractive candidate for the hard x-ray imaging, especially above 20 keV. A micro-columnar film with 10 mu m thickness of Lu2O3:Eu was firstly obtained by laser chemical vapor deposition on not-oriented Lu2O3 single crystal substrate. The morphology of obtained film was investigated by the scanning electron microscopy. The photoluminescence and scintillation properties were measured and discussed, including photoluminescence excitation and photoluminescence curves, photoluminescence decay curves, and x-ray excited luminescence curve.