Surface segregation in yttria-stabilized zirconia by means of angle resolved X-ray photoelectron spectroscopy
Surface segregation in yttria-stabilized zirconia by means of angle resolved X-ray photoelectron spectroscopy
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DOI：
10.1016/s0022-3697(01)00135-4
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发表时间：
2002-02
影响因子：
4
通讯作者：
A. Bernasik;K. Kowalski;A. Sadowski
中科院分区：
文献类型：
--
作者：
A. Bernasik;K. Kowalski;A. Sadowski
在800 ~ 1400℃的空气中，研究了未掺杂和掺钛氧化钇稳定氧化锆中阳离子的表面偏析。利用角分辨x射线光电子能谱分析了各元素的表面组成和分布。退火过程诱导出低锆浓度的富硅表面层。钇的浓度仅在表面略有增加。在掺钛钇稳定氧化锆中，钛的富集系数高于钇。其他阳离子的偏析没有明显的相关性。
Surface segregation of cations in undoped and titanium-doped yttria-stabilized zirconia was studied in air in the temperature range from 800 to 1400°C. Surface composition and distribution of the elements across the surface layer was examined using angle resolved X-ray photoelectron spectroscopy. The annealing procedure induced a silicon-rich surface layer of low zirconium concentration. The yttrium concentration only slightly increased at the surface. Enrichment factor of titanium in the titanium-doped yttria-stabilized zirconia was found to be higher than that of yttrium. No significant correlation between segregation of other cations was found.