Hiroharu Kawasaki: "Characterization of Tantalum Nitride Thin Films Fabricated by Pulsed Nd : YAG Laser Deposition Method"Jpn. J. Appi. Phys.. 40巻. 2391-2394 (2001)
Hiroharu Kawasaki: "Characterization of Tantalum Nitride Thin Films Fabricated by Pulsed Nd : YAG Laser Deposition Method"Jpn. J. Appi. Phys.. 40巻. 2391-2394 (2001)
复制标题
Hiroharu Kawasaki:“脉冲 Nd 氮化钽薄膜的表征:YAG 激光沉积法”Jpn. J. Appi.. Vol. 40. 2391-2394 (2001)
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: