Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream
Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream
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DOI：
10.1063/1.5018231
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发表时间：
2018-05
影响因子：
2.2
通讯作者：
Alexander Tovstopyat;I. Gafarov;V. Galeev;V. Azarova;A. Golyaeva
中科院分区：
文献类型：
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作者：
Alexander Tovstopyat;I. Gafarov;V. Galeev;V. Azarova;A. Golyaeva
表面粗糙度对材料的机械、光学和电子性能有着巨大的影响。在现代光学系统中，对基板的表面精度和光滑度的要求变得更加严格。采用射频（RF）感应耦合（13.56 MHz）低压等离子体对市售预抛光玻璃陶瓷基板进行处理，以清洁样品表面并降低粗糙度。光学发射光谱被用来调查等离子体流参数和相移干涉法调查样品的表面。在这项工作中，RF电感耦合等离子体的宏观参数的依赖关系进行了研究，重点是改善表面。离子能量，溅射速率，和均匀性进行了研究。通过去除之前操作后的“废物”，实现了玻璃陶瓷表面从2.6 A均方根到2.2 A均方根的改进。
The surface roughness has a huge effect on the mechanical, optical, and electronic properties of materials. In modern optical systems, the specifications for the surface accuracy and smoothness of substrates are becoming even more stringent. Commercially available pre-polished glass-ceramic substrates were treated with the radio frequency (RF) inductively coupled (13.56 MHz) low-pressure plasma to clean the surface of the samples and decrease the roughness. Optical emission spectroscopy was used to investigate the plasma stream parameters and phase-shifted interferometry to investigate the surface of the specimen. In this work, the dependence of RF inductively coupled plasma on macroscopic parameters was investigated with the focus on improving the surfaces. The ion energy, sputtering rate, and homogeneity were investigated. The improvements of the glass-ceramic surfaces from 2.6 to 2.2 A root mean square by removing the “waste” after the previous operations had been achieved.