Dynamics of nanoscale pattern formation of an epitaxial monolayer

Dynamics of nanoscale pattern formation of an epitaxial monolayer
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DOI:
10.1016/s0022-5096(01)00023-0
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发表时间:
2001-09
影响因子:
5.3
通讯作者:
Wei Lu;Z. Suo
Wei Lu;Z. Suo
中科院分区:
工程技术2区
文献类型:
--
作者:
Wei Lu;Z. Suo

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在弹性基底上生长的两相单层可以形成纳米级的条带或点。有时这些条纹和点排列成超晶格。本文报道了作者最近提出的一个模型的基础上的模拟。的尺寸选择和空间有序的结果从两个竞争的行动:相边界能量趋于粗化的阶段,和浓度依赖的表面应力趋于细化的阶段。外延层中的浓度场与衬底中的应力场之间存在非线性扩散方程耦合。模拟显示了非常丰富的动态。外延层可以演变成各种图案,这表明在生长纳米级超晶格时,实验控制程度很高,就像在生长原子晶体一样。
A two-phase monolayer grown on an elastic substrate may form stripes or dots on the scale of nanometers. Sometimes these stripes and dots order into superlattices. This paper reports on a simulation on the basis of a model proposed by the authors recently. The size selection and spatial ordering result from two competing actions: the phase boundary energy tends to coarsen the phases, and the concentration-dependent surface stress tends to refine the phases. A nonlinear diffusion equation couples the concentration field in the epilayer and the stress field in the substrate. The simulation reveals remarkably rich dynamics. An epilayer may evolve into various patterns, suggesting a significant degree of experimental control in growing nanoscale superlattices, just as in growing atomic crystals.