Oxidation and hydrogen isotope exchange in amorphous, deuterated carbon films
Oxidation and hydrogen isotope exchange in amorphous, deuterated carbon films
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非晶氘化碳膜中的氧化和氢同位素交换
DOI：
10.1016/s0022-3115(96)00745-3
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发表时间：
1997
影响因子：
3.1
通讯作者：
J. Roth
中科院分区：
文献类型：
--
作者：
Wenmin Wang;W. Jacob;J. Roth
研究了沉积在硅上的非晶氘化碳（a-C:D）膜的氢解吸和空气氧化。结果与安装在托卡马克ASDEX升级装置壁上的硅收集器样品在6个月的等离子体运行中沉积的氢化碳层进行了比较。通过射频辉光放电方法将a- c:D薄膜沉积在硅衬底上，在室温和500 - 800 K之间暴露于空气中。用ERD（弹性反冲探测）和PES（质子增强散射）测量了氘和碳的总量和深度分布。发现表面氘的损失伴随着膜内的氧吸收和氢同位素交换，直到氘完全释放。进一步退火导致整个碳层的去除。根据以前的氧注入研究，侵蚀被建模为由于碳和氘与空气中的氧的化学反应。在相同的处理条件下，ASDEX-Upgrade样品中共沉积层的去除速度要比a-C:D膜快得多。去除率很大程度上取决于膜的结构。
The hydrogen desorption and air oxidation of amorphous deuterated carbon (a-C:D) films deposited on Si areinvestigated. The results are compared with a hydrogenated carbon layer deposited on a silicon collector sample mounted on the wall of tokamak ASDEX Upgrade during 6 months' plasma operation. The a-C:D films, deposited on a silicon substrate by the RF glow-discharge method, are exposed to air at room temperature and between 500 and 800 K. The total amounts and depth profiles of both deuterium and carbon are measured by ERD (elastic recoil detection) and PES (proton enhanced scattering). It is found that the surface deuterium loss is accompanied by oxygen uptake and hydrogen isotope exchange in the film until deuterium is completely released. Further annealing leads to the removal of the whole carbon layer. In accordance with previous oxygen implantation studies the erosion is modeled to be due to the chemical reaction of carbon and deuterium with oxygen from air. The removal of the codeposited layer from the ASDEX-Upgrade sample proceeds much faster than that found for a-C:D films under identical treatment conditions. The removal rate strongly depends on film structure.