Fourier Analysis of Interference Structure in X-Ray Specular Reflection from Thin Films
Fourier Analysis of Interference Structure in X-Ray Specular Reflection from Thin Films
复制标题
薄膜 X 射线镜面反射干涉结构的傅里叶分析
DOI:
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发表时间:
1992
期刊:
影响因子:
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通讯作者:
K. Iida
中科院分区:
文献类型:
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作者:
K. Iida
Interference oscillation observed in X-ray total external reflection from thin films was analyzed by the Fourier transform algorithm. The peak position in Fourier space was in good agreement with the layer thickness, and was determined independently from the surface/interface roughness. The principle of the present technique and its application to SiO2/Si thin films are shown. The advantages of the experiments using tunable synchrotron X-rays are also discussed.