Chemical imaging of the surface of self-assembled polystyrene-b-poly(methyl methacrylate) diblock copolymer films using apertureless near-field IR microscopy.
Chemical imaging of the surface of self-assembled polystyrene-b-poly(methyl methacrylate) diblock copolymer films using apertureless near-field IR microscopy.
复制标题
使用无孔近场红外显微镜对自组装聚苯乙烯-b-聚（甲基丙烯酸甲酯）二嵌段共聚物薄膜表面进行化学成像。
DOI：
10.1021/la703406d
复制
发表时间：
2008
期刊：
影响因子：
--
通讯作者：
Walker,GilbertC
中科院分区：
文献类型：
--
作者：
Mueller,Kerstin;Yang,Xiujuan;Paulite,Melissa;Fakhraai,Zahra;Gunari,Nikhil;Walker,GilbertC
The nanoscale chemical composition variations of the surfaces of thin films of polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers are investigated using apertureless near-field IR microscopy. The scattering of the incident infrared beam from a modulated atomic force microscopy (AFM) tip is probed using homodyne detection and demodulation at the tip oscillation frequency. An increase in the IR attenuation is observed in the PMMA-rich domains with a wavenumber dependence that is consistent with the bulk absorption spectrum. The results indicate that even though a small topography-induced artifact can be observed in the near-field images, the chemical signature of the sample is detected clearly.
