Initial operation of a large‐scale plasma source ion implantation experiment
Initial operation of a large‐scale plasma source ion implantation experiment
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大规模等离子体源离子注入实验的初步操作
DOI：
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发表时间：
1994
期刊：
影响因子：
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通讯作者：
D. Rej
中科院分区：
文献类型：
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作者：
B. Wood;I. Henins;R. Gribble;W. Reass;R. Faehl;M. Nastasi;D. Rej
在等离子体源离子注入（PSII）中，将被注入的工件浸入弱电离等离子体中并脉冲到高负电压。等离子体离子向工件加速并注入工件表面。最近在洛斯阿拉莫斯进行了一次大规模的PSII实验，将表面积超过4平方米的不锈钢和铝工件植入直径1.5米、长4.6米的圆柱形真空室中。该脉冲调制器在50千伏、峰值电流为53 A的20 μs脉冲下进行了初始植入，并在500 Hz的频率下重复，但最终将提供120千伏、峰值电流为60 A、2 kHz的脉冲。1000 W， 13.56 MHz电容耦合源在低至0.02 mTorr的中性压力下产生1015 m−3范围内的氮等离子体密度。各种天线配置已经被尝试过，有和没有高达60g的轴向磁场。测量护套膨胀，调制器电压和电流，等离子体密度填充后的pu…
In plasma source ion implantation (PSII), a workpiece to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Plasma ions are accelerated toward the workpiece and implanted in its surface. A large‐scale PSII experiment has recently been assembled at Los Alamos, in which stainless steel and aluminum workpieces with surface areas over 4 m2 have been implanted in a 1.5 m diam, 4.6 m length cylindrical vacuum chamber. Initial implants have been performed at 50 kV with 20 μs pulses of 53 A peak current, repeated at 500 Hz, although the pulse modulator will eventually supply 120 kV pulses of 60 A peak current at 2 kHz. A 1000 W, 13.56 MHz capacitively coupled source produces nitrogen plasma densities in the 1015 m−3 range at neutral pressures as low as 0.02 mTorr. A variety of antenna configurations have been tried, with and without axial magnetic fields of up to 60 G. Measurements of sheath expansion, modulator voltage and current, and plasma density fill‐in following a pu...