Defect chemistry model of the ferroelectricelectrode interface

Defect chemistry model of the ferroelectricelectrode interface
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DOI:
10.1080/10584589508220224
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发表时间:
1995-02
影响因子:
0.7
通讯作者:
C. Brennan
C. Brennan
中科院分区:
工程技术4区
文献类型:
--
作者:
C. Brennan

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Abstract The interactions between the electrodes and titanate ceramic materials are examined using numerical defect chemistry models. A time independent model solves for the steady-state concentrations of electrons and holes, ionized acceptors, and oxygen vacancy concentrations throughout the ferroelectric film as a function of electrical potential, temperature, and oxygen partial pressure. These calculations reveal a basic mechanism by which electrically active space charge regions may form in the ferroelectric material. The combination of atmospheric oxygen partial pressure with ionization energies of naturally occurring acceptor impurities of around one electron-volt prevents full ionization of the acceptors. However, the acceptors respond strongly to an electric field, and the percentage of ionized acceptors in the interface region may range from 0% to 100% with the application of a few tenths of a volt. The response of the partially ionized impurities to the electric field is the proposed mechanism f...