High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films
High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films
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高能离子和原子从磁控管源溅射和反射，用于沉积磁性薄膜
DOI：
10.1116/1.1943452
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
H. Sugai
中科院分区：
文献类型：
--
作者：
H. Matsui;H. Toyoda;H. Sugai
在磁控溅射过程中，粒子对基底的适度轰击会对沉积薄膜产生有利的影响，而过度的高能量轰击可能会导致薄膜损伤和表面粗糙。为了明确这些影响，在磁控溅射 Permalloy™ 靶材 (80%Ni∕20%Fe) 的情况下，通过质谱仪和能量分析仪综合测量高能离子和中性粒子。在低于 4 Pa 的氩气中，通过直流磁控管放电（~600V，<0.2A）从靶材溅射出 Ni 原子，其能量分布函数 (EDF) 扩展至~8eV。对于 Ni+ 离子也观察到类似的 EDF 形状，这些离子可能是由 Ni 原子在气相中的电子轰击电离产生的。 Ar+ 离子的 EDF 具有~150eV 的极高能量尾部。这种高能离子的产生暂时可以用约 600eVAr+ 离子撞击目标表面中和后从目标反射的高能 Ar 原子的共振电荷交换来解释。
In the magnetron sputtering process, moderate bombardment of particles on a substrate gives favorable effects on the deposited films, while excessive bombardment at high energies may cause film damage and surface roughness. To make these influences clear, high-energy ions and neutrals are comprehensively measured by a mass spectrometer with an energy analyzer in the case of magnetron sputtering of a Permalloy™ target (80%Ni∕20%Fe). Ni atoms sputtered from the target by a dc magnetron discharge (∼600V, <0.2A) in argon below 4 Pa have an energy distribution function (EDF) spreading up to ∼8eV. A similar shape of EDF is also observed for Ni+ ions, which are produced possibly by electron-impact ionization of Ni atoms in gas phase. The EDF of Ar+ ions has a tail of extremely high energies of ∼150eV. Production of such energetic ions is tentatively explained in terms of resonant charge exchange of energetic Ar atoms reflected from the target after surface neutralization of ∼600eVAr+ ions impinging on the target...