Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
Selective Growth of Homo-Epitaxial Ag-Nano-Layer on Tribo-Assisted-Reorientation
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摩擦辅助重定向上同质外延银纳米层的选择性生长
DOI：
10.2474/trol.3.173
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发表时间：
2008
期刊：
影响因子：
1
通讯作者：
K. Akimoto
中科院分区：
文献类型：
--
作者：
M. Goto;H. Kobayashi;K. Akimoto
利用原位反射高能电子衍射（RHEED）研究了在重取向Ag（111）表面分别生长厚度为5、50和500 nm的增量Ag薄膜的生长过程和取向程度。利用同步轨道辐射x射线衍射（sorx - xrd）分析了各增镀银膜的银晶粒取向，阐明了增镀银膜取向与增镀银厚度之间的关系。RHEED观察表明，在重定向ag（111）表面生长的增量ag薄膜厚度可达500 nm。在初始多晶-Ag膜上生长的Ag膜在厚度达到50 nm时仍呈多晶结构，在500 nm处Ag（111）取向占主导地位。SOR-XRD分析结果与RHEED分析结果吻合较好。sorx - xrd分析表明，随着厚度的增加，Ag{111}晶粒在多晶膜中的生长速度也优于其他Ag {hkl}晶粒。薄膜的增量取向程度随着厚度的增加而增加，当厚度在纳米级范围内时，薄膜在重取向Ag（111）表面的高取向程度的优势得到增强。提出了一种利用摩擦辅助重定向选择性生长外延银层的新方法。
The growth process and orientational degree of incremental-Ag films with a thickness of 5, 50 and 500 nm, respectively, on reoriented Ag (111) surface were studied by in-situ reflection high-energy electron diffraction (RHEED). The orientation of Ag grains for each incremental-Ag-film was also analyzed by synchrotron-orbital-radiated X-ray diffraction (SOR-XRD) to clarify the correlation between the film orientation and the incremental thickness by additional Ag deposition. RHEED observations showed that the incremental-Ag-film grows epitaxially on the reoriented-Ag (111) surface up to 500 nm in thickness. The Ag film, which grew on initial polycrystalline-Ag film, still showed a polycrystalline structure up to 50 nm in thickness, and the Ag (111) orientation is dominant at a thickness of 500 nm. The results of SOR-XRD analysis agreed well with those of RHEED. SOR-XRD analysis showed that the growth rate of Ag {111} grains in the polycrystalline film was also superior to that of other Ag {hkl} grains as the thickness increases. The degree of incremental film orientation increased as the incremental thickness increased, and the advantage in the high orientational degree of the incremental film on the reoriented Ag (111) surface was enhanced when the incremental thickness was within the nanometric range. A new method for selective growth of the epitaxial Ag layer using tribo-assisted reorientation was presented.
超高真空环境下纳米厚银膜的摩擦辅助重定向
DOI：
--
发表时间：
2006
期刊：
I. Mech. E., J.Engineering Tribology (accepted for publication)
影响因子：
--
作者：
M.Goto;K.Akimoto;F.Honda;T.Nakahara
通讯作者：
T.Nakahara
Si(111) 7x7 表面 Ag 亚纳米厚膜在高温下的摩擦学行为
DOI：
--
发表时间：
2004
期刊：
Wear vol.256
影响因子：
--
作者：
M.Goto;R.Nakata;F.Honda
通讯作者：
F.Honda