Green Lithography for Delicate Materials
Green Lithography for Delicate Materials
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DOI：
10.1002/adfm.202101533
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发表时间：
2021-04
影响因子：
19
通讯作者：
A. Grebenko;A. Bubis;K. Motovilov;V. Dremov;E. Korostylev;I. Kindiak;F. Fedorov;S. Luchkin;Yuliya Zhuikova;A. Trofimenko;G. Filkov;Georgiy Sviridov;A. Ivanov;Jordan T. Dull;R. Mozhchil;A. Ionov;V. Varlamov;Barry P Rand;V. Podzorov;A. Nasibulin
中科院分区：
文献类型：
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作者：
A. Grebenko;A. Bubis;K. Motovilov;V. Dremov;E. Korostylev;I. Kindiak;F. Fedorov;S. Luchkin;Yuliya Zhuikova;A. Trofimenko;G. Filkov;Georgiy Sviridov;A. Ivanov;Jordan T. Dull;R. Mozhchil;A. Ionov;V. Varlamov;Barry P Rand;V. Podzorov;A. Nasibulin
人们正在积极探索各种非常规材料，包括生物纳米结构、有机和混合半导体以及单层和其他低维系统。它们通常与使用刺激性有机溶剂和其他有害处理的标准光刻技术不兼容。在这里，开发了一种新型绿色温和光刻抗蚀剂，与精致材料兼容，并且能够进行自上而下和自下而上的制造程序。为了证明这种方法的卓越性，在有机半导体晶体和个体动物的大脑微管上制造了具有亚微米特征的器件。由于真正的水基光刻技术，这种结构首次被创造出来，为在纳米尺度上非常规精密材料的彻底研究开辟了道路。
A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low‐dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top‐down and bottom‐up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub‐micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water‐based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.