Micropatterned Freestanding Superelastic TiNi Films
Micropatterned Freestanding Superelastic TiNi Films
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DOI：
10.1002/adem.201200197
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发表时间：
2013-02-01
影响因子：
3.6
通讯作者：
Quandt, Eckhard
中科院分区：
文献类型：
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作者：
de Miranda, Rodrigo Lima;Zamponi, Christiane;Quandt, Eckhard
厚度在20 μ m和100 μ m之间的微图案化独立式超弹性TiNi膜是用于医学体内应用的有吸引力的材料。通过UV光刻和蚀刻对这些材料进行微图案化是一项具有挑战性的任务，因为湿法蚀刻由于其各向同性性质而具有严重的设计限制，而干法蚀刻显示出非常低的蚀刻速率。本研究提出了一种基于UV光刻、牺牲层和湿法刻蚀技术制备最小特征尺寸为5 μ m的独立TiNi薄膜（厚度大于20 μ m）的方法。该方法已成功地应用于50 μ m厚、25 μ m特征尺寸的TiNi薄膜的制备。这些超弹性薄膜显示出显著的拉伸强度高达1100MPa和断裂伸长率超过40%。
Micropatterned freestanding superelastic TiNi films in the thickness range between 20 and 100 mu m are attractive materials for medical in vivo applications. Micropatterning of these materials by UV lithography and etching is a challenging task, as wet etching has severe design limitations due to its isotropic nature while dry etching shows much to low etching rates. This study presents a method to fabricate freestanding TiNi films (with thicknesses higher than 20 mu m) with a minimum feature size 5 mu m based on UV lithography, sacrificial layer and wet etching technology. This method was successfully applied to the fabrication of TiNi films with 50 mu m thickness and 25 mu m feature size. These superelastic films showed remarkable tensile strengths up to 1100MPa and elongations upon fracture of more than 40%.