Mass filtered plasma focused ion beam system

Mass filtered plasma focused ion beam system
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DOI:
10.1116/1.4764920
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发表时间:
2012-11-01
影响因子:
1.4
通讯作者:
Schwind, Greg
Schwind, Greg
中科院分区:
工程技术4区
文献类型:
--
作者:
Otis, Charles E.;Graupera, Anthony;Schwind, Greg

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作者描述了一种与质量可调Wien(E x B)过滤器组合的电感耦合等离子体离子源,其能够递送单一或混合气体等离子体生成的离子。用于RF供电离子源的气体可以通过混合单独的气体而预混合或具有可变的化学计量。气体混合物可以包含提供轻到重气态离子的多种元素,其可以通过质量过滤来选择。等离子体源的优化包括改变参数,例如RF功率、压力和气体化学计量。随后,质量过滤器/等离子体气体离子柱可以针对广泛的应用进行优化。例如,使用高降低亮度光离子(例如,例如,在一个实施例中,用于次表面成像)或使用重离子的快速材料去除可以在宽范围的束电流(通常为10 pA到10 μ A)上用相同的气体混合物来实现。作者研究了几种候选物种(He+,Ne+,Ar+,He+,O-2(+),O+,O-,N+,N-2(+),H+,H-2(+),H-3(+)),并给出了这些最近的结果的一个子集,涉及从H-2和O-2/H2O混合物产生H+。(C)2012年美国真空学会。[http://dx.doi.org/10.1116/1.4764920]
The authors describe an inductively coupled plasma ion source combined with a mass tunable Wien (E x B) filter that is capable of delivering single or mixed gas plasma generated ions. Gases for the RF powered ion source can be premixed or of variable stoichiometry by mixing individual gases. The gas mixtures can contain a variety of elements providing light to heavy gaseous ions which can be selected by mass filtering. Optimization of the plasma source consists of varying parameters such as the RF power, pressure, and gas stoichiometry. Subsequently, the mass filter/plasma-gas ion column can be optimized for a wide range of applications. For example, high resolution imaging using high reduced brightness light ions (e. g., for subsurface imaging) or fast material removal using heavy ions may be accomplished across a wide range of beam currents, typically 10 pA to 10 mu A, with the same gas mixture. The authors have examined several candidate species (He+, Ne+, Ar+, Xe+, O-2(+), O+, O-, N+, N-2(+), H+, H-2(+), H-3(+)) and present a subset of these recent results involving production of H+ from H-2 and O-2/H2O mixtures. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4764920]