Electric-Field and Mechanical Vibration-Assisted Atomic Force Microscope-Based Nanopatterning
Electric-Field and Mechanical Vibration-Assisted Atomic Force Microscope-Based Nanopatterning
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基于电场和机械振动辅助原子力显微镜的纳米图案化
DOI：
10.1115/1.4056731
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发表时间：
2022
影响因子：
1
通讯作者：
Deng, Jia
中科院分区：
文献类型：
--
作者：
Zhou, Huimin;Jiang, Yingchun;Ke, Changhong;Deng, Jia
基于原子力显微镜(AFM)的纳米光刻技术是一种低成本的纳米刻蚀技术，可以制造任意形状的纳米结构。然而，现有的基于AFM的纳米刻蚀方法在图案化分辨率和效率方面存在局限性。在机械力诱导纳米加工过程中，AFM针尖的半径和锐度限制了最小特征尺寸和加工性能。电场辅助原子力显微镜(E-AFM)纳米光刻可以制备特征小于针尖半径的纳米粒子，但要找到合适的输入参数窗口是非常具有挑战性的。由于针尖几何形状、针尖末端直径和针尖导电层厚度的不同，E-AFM工艺中的针尖偏置范围通常很小，并且每个AFM针尖的偏置范围都不同。本文提出了一种新的电场和机械振动辅助原子力显微镜纳米加工方法，实现了高分辨率(小于10 nm到小于5 nm)和高效的纳米加工过程。与E-AFM工艺相比，面内振动与电场的结合提高了构图速度，拓宽了施加电压的选择范围，降低了纳米刻蚀所需的最小针尖偏置，显著提高了AFM基纳米刻蚀的通用性和能力，并有效地避免了针尖的损伤。
Atomic force microscope (AFM)-based nanolithography is a cost-effective nanopatterning technique that can fabricate nanostructures with arbitrary shapes. However, existing AFM-based nanopatterning approaches have limitations in the patterning resolution and efficiency. Minimum feature size and machining performance in the mechanical force-induced nanofabrication process are limited by the radius and sharpness of the AFM tip. Electric-field-assisted atomic force microscope (E-AFM) nanolithography can fabricate nanopatterns with features smaller than the tip radius, but it is very challenging to find the appropriate input parameter window. The tip bias range in E-AFM process is typically very small and varies for each AFM tip due to the variations in tip geometry, tip end diameter, and tip conductive coating thickness. This paper demonstrates a novel electric-field and mechanical vibration-assisted AFM-based nanofabrication approach, which enables high-resolution (sub-10 nm toward sub-5 nm) and high-efficiency nanopatterning processes. The integration of in-plane vibration with the electric field increases the patterning speed, broadens the selectable ranges of applied voltages, and reduces the minimum tip bias required for nanopatterning as compared with E-AFM process, which significantly increases the versatility and capability of AFM-based nanopatterning and effectively avoids the tip damage.