Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope

Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope
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使用 Kirkpatrick-Baez 显微镜表征激光等离子体加速器 X 射线源尺寸

DOI:
10.1117/12.2522778
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发表时间:
2019
期刊:
--
影响因子:
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通讯作者:
Shahzad M
Shahzad M
中科院分区:
--
文献类型:
--
作者:
Shahzad M

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激光等离子体加速器用途广泛,是辐射束和粒子束的来源,具有独特的性能。斯特拉斯克莱德大学苏格兰基于应用的等离子体加速器中心 (SCAPA) 40 TW 和 350 TW 激光器已被用于通过激光尾场加速器 (LWFA) 产生软和硬 X 射线。这些飞秒脉冲 X 射线的固有特性使其成为探测物质和超快成像应用的理想选择。为了支持 SCAPA 设施激光等离子体加速器应用的开发,设计了可调节 Kirkpatrick-Baez X 射线显微镜来聚焦 50 eV - 10 KeV X 射线。现在可以生产可用于 X 射线光学器件的高质量硅晶圆基板。 KB 仪器中使用镀铂 (40 nm) 硅片对 LWFA X 射线源进行成像。我们模拟源分布作为研究的一部分,以确定 X 射线源的大小,从而确定其横向相干性,并最终确定峰值亮度。 OASYS SHAODOW-OUI 光线追踪和波传播代码已用于模拟成像设置并确定仪器分辨率。
Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.
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