Effect of Adsorbed Matter on Intense Pulsed Ion Beam Generation
Effect of Adsorbed Matter on Intense Pulsed Ion Beam Generation
复制标题
吸附物质对强脉冲离子束产生的影响
DOI：
10.1143/jjap.32.4838
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发表时间：
1993
影响因子：
1.5
通讯作者：
Sadao Nobuhara Sadao Nobuhara
中科院分区：
文献类型：
--
作者：
Y. Hashimoto;Mitsuyasu Yatsuzuka Mitsuyasu Yatsuzuka;Sadao Nobuhara Sadao Nobuhara
对高纯度强流脉冲离子束的产生进行了实验研究。离子束中的杂质离子被发现是由阳极上的吸附物质和二极管室中的残留气体分子引起的。在不破坏二极管腔室真空的情况下的前几次发射被发现有效地去除阳极上的吸附物质，并导致更高纯度的离子束。在10 ~（-2）~ 10 ~（-3）Pa的范围内改变残余气压或将阳极置于大气中10 ~ 10 h后，未观察到对离子束电流的影响。二极管室中的残余气体分子对离子束的纯度几乎没有影响。在前5次发射后，发现离子束的电流为3.0 kA。离子束中最主要的种类是F2+。
Generation of intense pulsed ion beams with high purity has been studied experimentally. Impurity ions in the ion beams were found to be caused by adsorbed matter on the anode and residual gas molecules in the diode chamber. The first few shots without breaking vacuum in the diode chamber were found to be effective to remove the adsorbed matter on the anode, and lead to higher purity of the ion beams. No effect on the ion beam current was observed upon changing the residual gas pressure in the range from 10-2 to 10-3 Pa or upon leaving the anode in atmosphere for ∼10 h. Residual gas molecules in the diode chamber had little effect on the purity of the ion beams. After the first 5 shots, the current of the ion beams was found to be 3.0 kA. The most dominant species in the ion beams was F2+.