Scanning coherent x-ray microscopy as a tool for XFEL nanobeam characterization
Scanning coherent x-ray microscopy as a tool for XFEL nanobeam characterization
复制标题
扫描相干 X 射线显微镜作为 XFEL 纳米束表征的工具
DOI：
10.1117/12.2024784
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
C. Schroer
中科院分区：
文献类型：
--
作者：
A. Schropp;R. Hoppe;J. Patommel;F. Seiboth;F. Uhlén;U. Vogt;H. Lee;B. Nagler;E. Galtier;U. Zastrau;B. Arnold;P. Heimann;J. Hastings;C. Schroer
During the last years, scanning coherent x-ray microscopy, also called ptychography, has revolutionized nanobeamcharacterization at third generation x-ray sources. The method yields the complete information on the complex valued, nanofocused wave field with high spatial resolution. In an experiment carried out at the Matter in Extreme Conditions (MEC) instrument at the Linac Coherent Light Source (LCLS) we successfully applied the method to an attenuated nanofocused XFEL beam with a size of 180(h) × 150(v)nm2 (FWHM) in horizontal (h) and vertical direction (v), respectively. It was created by a set of 20 beryllium compound refractive lenses (Be-CRLs). By using a fast detector (CSPAD) to record the diffraction patterns and a fast implementation of the phase retrieval code running on a graphics processing unit (GPU), the applicability of the method as a real-time XFEL nanobeam diagnostic is highlighted.
影响因子：
4.6
作者：
Schropp, Andreas;Hoppe, Robert;Meier, Vivienne;Patommel, Jens;Seiboth, Frank;Lee, Hae Ja;Nagler, Bob;Galtier, Eric C.;Arnold, Brice;Zastrau, Ulf;Hastings, Jerome B.;Nilsson, Daniel;Uhlen, Fredrik;Vogt, Ulrich;Hertz, Hans M.;Schroer, Christian G.
通讯作者：
Schroer, Christian G.