LIGHT-SENSITIVE AMIDES - PHOTOSOLVOLYSIS OF SUBSTITUTED 1-ACYL-7-NITROINDOLINES
LIGHT-SENSITIVE AMIDES - PHOTOSOLVOLYSIS OF SUBSTITUTED 1-ACYL-7-NITROINDOLINES
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DOI:
10.1021/ja00419a038
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发表时间:
1976-01-01
影响因子:
15
通讯作者:
PATCHORNIK, A
中科院分区:
文献类型:
--
作者:
AMIT, B;BENEFRAIM, DA;PATCHORNIK, A
Carboxyl functions are generally protected by conversion to esters. Their protection via their amides is rarely encoun-tered since the amide group is generally more resistant to basic and acidic solvolysis than the ester group, and therefore rather vigorous conditions are needed to cleave it. On the other hand, the stability of the amide bond towards sol-volytic conditionscould be turned to an advantage, if a spe-cific and mild method for its cleavage were available. The photolysis of amides to furnish free carboxylic acids in sig-nificant yields has not been reported1 until a few years ago. We have recently described amides derived from N-substituted o-nitroanilines2 and 8-nitro-1, 2, 3, 4-tetrahydroquino-lines, 3 which on photolysis in benzene or alcohol afford the free carboxylic acids in high yields. We now wish to report new light sensitive amides which undergo smooth photosolvolysis. Irradiation of amides 1, derived from 5-bromo-7-nitroindoline (2a) and 5, 7-dinitroindoline (2b), in the presence of water, furnished the free carboxylic acids (Table I) and the starting indolines 2a and 2b in nearly quantitative yields (eq 1). Similarly, irradiation of amides 1 in the presence of alcohols afforded in high yields the corresponding esters (Table I) and indolines (eq 1). These photosolvolytic reactions can easily be followed by la, R= Ph; X= Br b, R= p-MeOCTL; X= Br c, R= m-NO, C6H4; X= Br d, R=